AE 的脉冲产品系列具有各种功能，能够满足您所有的困难和各式各样的工艺要求。这个灵活的直流脉冲附件系列提供 10-200kW 的功率以及 2-100kHz 的固定和可变频率。这个系列的每一项产品在设计上均具有相当的特点，能够针对反应和直流溅射提供经证实的优势。

DC Pulsing Products: Proven Benefits for Reactive & Conductive Sputtering brochure     

Pulsar DC 脉冲附件与 SCR（可控硅）直流电源使用指南      English    
Pulsar™ 大功率直流脉冲附件      English    
Arc Handling in RF-Superimposed DC Processes (2006)application note
Increasing Production Output with Pulsed-DC Accessories (2006) white paper
Signal Integrity for Vacuum Processing Systems (2003) white paper
Redundant Anode Sputtering: A Novel Approach to the Disappearing Anode Problem (2000) white paper
The Evolution of Power Delivery in Reactive Silicon Sputtering (1999) white paper
Effects of the Anode Configuration on Substrate Heating in Dual-Magnetron Sputtering (1999) white paper
Power Supplies for Pulsed Plasma Technologies: State-of-the-Art Outlook (1999) white paper
Enhanced Reactively Sputtered Al₂O₃ Deposition by Addition of Activated Reactive Oxygen (1999) white paper
Advances in Arc-Handling in Reactive and Other Difficult Processes (2001) white paper
Introducing Power Supplies and Plasma Systems (2001) white paper
Arcing Problems Encountered During Sputter Deposition of Aluminum (2000) white paper
Reactive Sputter Deposition of Aluminum Oxide Coatings, April 2004 magazine reprint
Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects, April 2000 magazine reprint
Fabs can ride through voltage sags with power-quality targets, July 2004, magazine reprint
Partial Pressure Control in Reactive Sputtering, June 2004 magazine reprint
An Economical Method for Process Control in Pulsed-
DC Magnetron Reactive Sputtering, June 2003 magazine reprint
Power Supplies Advance Beyond Volts and Amps, June 2003 magazine reprint
AE Global Services brochure