2008年 2007年 2006年 2005年 2004年 2003年 2002年 2001年 2000年 1999年
Optimising performance by integrating RF power and match technologies
Euro Asia Semiconductor, December 2007/January 2008
Considerations in the Selection of Vapor Delivery Subsystems
Gases & Instrumentation, March/April 2008
2006年
Managing Arcs in RF Powered Plasma ProcessesVacuum & Coating Technology, December 2006
Active Rectifier Inner Current Loop without Reference Frame Transformations in FeedbackIEEE, October 2006
Traditional Chinese version of AE Celebrates Its 25-Year Anniversary With New Product Launches Solid State Technology, October 2006
Effective Control for Reactive Sputtering Processes
Vacuum & Coating Technology, April 2006
Beyond Pressure Transients: Using Pressure-Insensitive MFCs to Control Gases In Semiconductor Manufacturing
Semiconductor Manufacturing, March 2006
2005年
Power Conversion and Control Reduces CoO and Improves Yield
Semiconductor International, March 2005
Powering to Better Yields
European Semiconductor, November 2005
2004年
A Novel Pulsed Supply With Arc Handling and Leading Edge Control
Society of Vacuum Coaters Inc., April 2004
High Power Pulse Reactive Sputtering of TiO2
Society of Vacuum Coaters Inc., April 2004
High Power Pulsed Reactive Sputtering of Zirconium Oxide and Tantalum Oxide
Society of Vacuum Coaters Inc., April 2004
Reactive Sputter Deposition of Aluminum Oxide Coatings
Society of Vacuum Coaters Inc., April 2004
Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases
Society of Vacuum Coaters Inc., April 2004
Stabilizing RF Generator and Plasma Interactions
Society of Vacuum Coaters, April 2004
Maximizing Tool Uptime and Process Stability Through an RF System Upgrade
MICRO, October/November 2004
Fabs Can Ride Through Voltage Sags with Power-Quality Targets
Solid State Technology, July 2004
A Novel Frequency-Domain Small-Signal Analysis of Resonant Power Converters
IEEE Transactions on Circuits and Systems, July 2004
Partial Pressure Control in Reactive Sputtering
Hidden Analytical Ltd., June 2004
2003年
Control of the Reactive Sputtering Process Using Two Reactive Gases
Society of Vacuum Coaters Inc., May 2003
Carbon Thin Film Deposition Using High Power Pulsed Magnetron Sputtering
Society of Vacuum Coaters Inc., May 2003
Power System Requirements for Enhanced Mid-Frequency Process Stability
Society of Vacuum Coaters Inc., May 2003
Mid-Frequency Dual Magnetron Reactive Co-Sputtering for Deposition of Customized Index Optical Films
Society of Vacuum Coaters Inc., May 2003
RF-Based Sensor Technology Improves Cleaning Efficiency on PECVD Tools
Semiconductor FABTECH, 2003
Integrated Process Control for Reactive Sputter Deposition of Dielectric Thin Films
Society of Vacuum Coaters, Inc., May 2003
An Economical Method for Process Control in Pulsed-DC Magnetron Reactive Sputtering
Semiconductor Manufacturing, June 2003
Power Supplies Advance Beyond Volts and Amps
Semiconductor International, June 2003
Future Trends in Integrated Systems...Change the View
European Semiconductor, May 2003
2002年
Biased Dual Magnetron Sputter Deposition of Alumina
Society of Vacuum Coaters, Inc., April 2002
Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide
Society of Vacuum Coaters, Inc., April 2002
Reactively Sputtering High on the Transition Curve Using a Few Inexpensive Components
Society of Vacuum Coaters, Inc., April 2002
Substrate Response During Dual Bipolar Pulsed Magnetron Sputtering
Society of Vacuum Coaters, Inc., April 2002
Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide
Society of Vacuum Coaters, 45th Annual Technical Conference Proceedings, 2002
DC Sputtering Cuts Deposition Times and Costs
Photonics Spectra, November 2002
Adopting E-Manufacturing in the Semiconductor Industry
MICRO, October 2002
E-Diagnostics: Moving Beyond the Data Ownership Issue
Solid State Technology, August 2002
Industry Observation: E-Manufacturing Solutions Converge
Semiconductor International, July 2002
A New Generation of Power Supplies for Large Area Dual Magnetron Sputtering
Vacuum & Coating Technology, April 2002
2001年
Can Take the Heat
European Semiconductor, July 2001
Increase Productivity Through E-Manufacturing
Semiconductor International, July 2001
Reactive Sputtering Using a Dual-Anode Magnetron System
Society of Vacuum Coaters, Inc., April 2001
Enhanced Reactively Sputtered Al2O3 Deposition by Addition of Activated Reactive Oxygen
Vacuum & Coating Technology, March 2001
Using Point-of-Use Plasma Sources to Shape a Fab's Environmental Footprint
Semiconductor Fabtech, March 2001
2000年
Single-Magnetron Approach Reactive Sputtering of Dielectrics
Vacuum & Coating Technology, September 2000
Beyond Consolidation
European Semiconductor, September 2000
Characterization of the Low-Voltage, High-Current Single-Cell Ion Source
Society of Vacuum Coaters, Inc., April 2000
Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects
Society of Vacuum Coaters, Inc., April 2000
1999年
Optimizing CVD Through RF MetrologyEuropean Semiconductor, September 1999