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Advanced Energy
A global leader in innovative power and control technologies that drive high-growth, plasma thin-film and nontech manufacturing processes.
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Pinnacle® Plus+

Advanced Energy (AE) 的 Pinnacle® Plus+ 电源为单体直流脉冲电源,为您的反应工艺提供脉冲直流电解决方案所有优点,包括使用简单、节约成本以及具有绝佳的灵活性。结合标准直流电技术和经过工艺证明的脉冲直流电技术,Pinnacle Plus+ 电源与复杂而昂贵的交流电解决方案相比,沉积率更高,重复性能更好,薄膜质量更为优异。

优势 特点
  • 更高的沉积率与产品率
  • 薄膜均匀性和品质一流 
  • 成弧造成的基材损坏减少 
  • 成本更低
  • 系统整合容易
  • 极佳的工艺灵活性和宽容度
  • 重复性能
  • 在过度曲线上运行稳定
  • 吞吐量更高
  • 便于监控
  • 无与伦比的系统灵活性
  • 一个紧凑型封装
  • 频率调节范围为 5-350kHz
  • 占空比高达45%
  • 电压范围宽——单输出宽阻抗范围 
  • 大功率运行
  • 基材温度低
  • 单输出(5kW 和 10kW 型号)
  • 用于双阴极生产的双输出(双路5kW 型号)
  • 绝佳的弧控制
  • 反应性溅射闭环控制


可下载文献

Pinnacle® Plus+ 脉冲直流电源     English    

Arc Handling in RF-Superimposed DC Processes (2006) application note
Increasing Production Output with Pulsed-DC Accessories (2006) white paper
Signal Integrity for Vacuum Processing Systems (2003) white paper
The Evolution of Power Delivery in Reactive Silicon Sputtering (1999) white paper
Power Supplies for Pulsed Plasma Technologies: State-of-the-Art Outlook (1999) white paper
Advances in Arc-Handling in Reactive and Other Difficult Processes (2001) white paper
Introducing Power Supplies and Plasma Systems (2001) white paper
Control of the Reactive Sputtering Process Using Two Reactive Gases, May 2003 magazine reprint
Integrated Process Control for Reactive Sputter Deposition of Dielectric Thin Films, May 2003 magazine reprint
Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects, April 2000 magazine reprint
Optical Emission Studies for the Characterization of Pulsed Magnetron Sputtering Systems, April 2002 magazine reprint
Parameter Optimization in Pulsed DC Reactive Sputter Deposition of Aluminum Oxide, April 2002 magazine reprint
Substrate Response During Dual Bipolar Pulsed Magnetron Sputtering, April 2002 magazine reprint
Fabs can ride through voltage sags with power-quality targets, July 2004 magazine reprint
A Novel Frequency-Domain Small-Signal Analysis of Resonant Power Converters, July 2004 magazine reprint
Power Supplies Advance Beyond Volts and Amps, June 2003 magazine reprint
DC Sputtering Cuts Deposition Times and Costs, November 2002 magazine reprint
Enhanced Reactively Sputtered Al2O3 Deposition by Addition of Activated Reactive Oxygen, March 2001 magazine reprint
AE Global Services brochure

 


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